# Ion Beam Source L280

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> Markdown version: https://vaclab.ru/devices/ion_beam_sources/ion-source-ii-280.md
> Manufacturer: LLC "Laboratory of Vacuum Technologies Plus" (LVT), vaclab.ru

Ion source with a 254x42x5 mm hollow rectangular beam and beam current up to 250 mA.

Gas-discharge ion sources for generating linear ion beams. Principle of operation - anode layer ion beam source. High uniformity of ion flux distribution along the source makes it the optimum choice for substrate treatment on a drum or a carousel.

Processes:

- sputtering of materials from dielectric and conductive targets;
- magnetron sputtering assistance;
- ion cleaning, etching;
- polishing;
- plasma-enhanced chemical vapor deposition (PECVD);
- surface modification.

## Technical specifications

- Voltage, V: 500–5000
- Beam shape: Полый прямоугольный
- Beam width, mm: 42
- Beam thickness, mm: 5
- Ion energy, eV: 250–2500
- Maximal current, mA: 250
- Gas efficiency, mA/sccm: 9
- Maximal linear current density, mA/cm: 25
- Maximal beam angle, °: 2°
- Beam length, mm: 254
- Maximum permissible voltage, V: 5500
- Weight, kg: 4,6
- Working gases: любой, не вызывающий осаждения высокоомных слоёв на деталях устройства
- Coolant: дистиллированная вода, 20 % раствор этилового спирта в дистиллированной воде по ГОСТ 6709-72
- Minimum coolant consumption, l/min: 1
- Chamber working pressure range, Pa: 0,001–10