# Magnetron L500

> Original page (HTML): https://vaclab.ru/devices/magnetrons/magnetron-500
> Markdown version: https://vaclab.ru/devices/magnetrons/magnetron-500.md
> Manufacturer: LLC "Laboratory of Vacuum Technologies Plus" (LVT), vaclab.ru

The principle of operation of the device is based on increasing the density of the gas discharge in crossed electric and magnetic fields.

Purpose: effective sputtering of targets from conductive materials by ion bombardment in an abnormal glow discharge plasma.

In the direct current mode, it is possible to apply metals and alloys (including resistive ones) while preserving the stoichiometric composition.

When using pulsed mid-frequency power supply, sputtering of semiconductors, as well as dielectrics in reactive mode from metal targets is possible.

## Technical specifications

- Maximal target thickness: 15 mm with target holder; 20 mm with direct water cooling
- Target length: 516 mm
- Target width: 110 mm
- Operating voltage, V: 2000 V
- Maximal current, A: 25 A
- Maximum power, W: 20000 W
- Operating pressure range, Pa: 0.05–10 Pa