# Magnetron L290

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> Manufacturer: LLC "Laboratory of Vacuum Technologies Plus" (LVT), vaclab.ru

Magnetron sputtering system for rectangular targets with nominal length 290 mm.

In DC mode of operation deposition of metals, alloys (including resistive) with preserving of composition stoichiometry is possible. Pulsed DC mode deposition of semiconductors and dielectrics is possible.

## Technical specifications

- Maximal target thickness: 15 mm with target holder; 20 mm with direct water cooling
- Target length: 290 mm
- Target width: 95 mm
- Operating voltage, V: 2000 V
- Maximal current, A: 20 A
- Maximum power, W: 12000 W
- Operating pressure range, Pa: 0.01–10 Pa