# Round magnetrons

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> Markdown version: https://vaclab.ru/devices/magnetrons/round_magnetrons.md
> Manufacturer: LLC "Laboratory of Vacuum Technologies Plus" (LVT), vaclab.ru

Devices designed for sputtering round targets.

Purpose: effective sputtering of targets made of conductive materials by ion bombardment in the plasma of an anomalous glow discharge, deposition of metals, alloys and dielectrics in a reactive mode.

The target holder and the magnetic system have independent cooling channels. Heat removal from the magnets is provided by a cooled shunt, which excludes the contact of the magnets with water, thereby increasing their service life.

Execution options:

ordinary,

superfast,

in a sealed case,

with built-in damper and actuator,

high frequency.