# Magnetron D50

> Original page (HTML): https://vaclab.ru/devices/magnetrons/round_magnetrons/magnetrion-d50
> Markdown version: https://vaclab.ru/devices/magnetrons/round_magnetrons/magnetrion-d50.md
> Manufacturer: LLC "Laboratory of Vacuum Technologies Plus" (LVT), vaclab.ru

Magnetron sputtering system (MSS) for round targets made of conductive materials with a diameter of 50 mm.

Purpose: effective sputtering of conductive targets by ion bombardment in plasma of anomalous glow discharge.

In DC mode, deposition of metals and alloys (including resistive) with preservation of stoichiometric composition is possible. With pulsed medium-frequency power, sputtering of semiconductors and dielectrics in reactive mode from metal targets is possible.

Minimum coolant consumption at a working power of 1 kW is 1 l/min.

Coolant (recommended): distilled water, 20% solution of ethyl alcohol in distilled water according to GOST 6709-72.

For various applications there are special versions.

## Technical specifications

- Target diameter: 50 mm
- Maximal target thickness: 3 mm
- Operating voltage, V: 300–800 V
- Maximal current, A: 5 A
- Maximum power, W: 1000 W
- Working gas: Argon
- Operating pressure range, Pa: 0.07–10 Pa