# Plasma source RFPG-128

> Original page (HTML): https://vaclab.ru/devices/plasma_sources/rf-plasma-generator-hf-matching
> Markdown version: https://vaclab.ru/devices/plasma_sources/rf-plasma-generator-hf-matching.md
> Manufacturer: LLC "Laboratory of Vacuum Technologies Plus" (LVT), vaclab.ru

Plasma source for dense plasma generation.

Purpose: creation and continuous maintenance of high-density gas discharge plasma in working spaces of vacuum technological machines. RFPG-128 allows obtaining of ion flux with density up to 50 mA/cm2 (at 1 kW).

Application: processes of ion and plasmachemical etching, depositing of thin film deposition, ion-plasma surface treatment: polishing, nitriding and carbonization. The devices work with any gases that do not cause depositing of low-resistance layers on the protective screen surface.

Radio frequency plasma generator RFPG-128 – is an electrodless plasma source designed for low temperature, dense plasma generation in a relative large volume. It can be installed on or inside any vacuum chamber. The RFPG-250 can be used in a wide range of plasma technologies:

- Plasmachemical processes: RIE, PECVD
- Deposition of various materials in the any operation gases (noble or reactive).
- Ion and plasma etching.
- Evaporation, including evaporation with additional ionization of the evaporated material.
- Ion surface modification (oxidation, reduction, nitriding, carbonization ...).
- Ion cleaning and assisting
- Annealing

RFPG-128 is designed to be used in any type of vacuum machines. Its base element is an inductive coil, which is placed inside an aluminium case. The case and sliding vacuum feedthrough provides an easy installation. The surface of the generator adjacent to plasma is protected by a quartz screen.

## Technical specifications

- Voltage, V: 24 V
- Interface: RS-485
- Data transfer protocol: ModBus
- Data transfer rate, bps: 9600, 19200, 38400, 57600 bps
- Maximal current: 3 A
- Maximal output current, A: 50 A for 3000W version 100 A for 5000W version
- Work zone diameter, mm: 100 mm
- Maximum power, W: 5000 W
- Pressure range, Pa: 0.1..10 Pa
- Case diameter, mm: 128 mm
- Feedthrough diameter, mm: 60 mm
- RF frequency, MHz: 13.56 MHz