# Inductive sources of high-density plasma and their technological applications

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This book is a comprehensive reference guide to the design and use of ICP sources. It summarizes the modern development of these technological processes and the equipment used for them.

The book describes the principles of operation, features and advantages of ICP sources and considers numerous design options for modern ICP sources. Examples of technological applications of the described sources for applying thin films are also given: in PVD and PECVD processes. And, in addition, the formation of three-dimensional structures in various materials and two-dimensional structures in thin films by plasma-chemical etching is described and a significant change in the surface properties of various materials, especially semiconductors, associated with such processing.