# NIKA-137 Machine spraying with a plasma clearance

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> Manufacturer: LLC "Laboratory of Vacuum Technologies Plus" (LVT), vaclab.ru

Small-sized installation of the "NIKA 12-500" series, designed for applying resistive evaporation of thin layers of metals up to 3 microns thick with direct control of the thickness at the time of application of layers. Water-cooled chamber with viewing Windows. Vacuum pumping system: dry, oil-free.

Thin layers of metals are performed by resistive evaporation with preliminary plasma cleaning and heating of the substrates.

Set of technological devices:

- RF-plasma generator (RFPG-128) for cleaning the surface of substrates
-  three resistive vaporizers
-  heater

On the lower (working) flange are placed:

- substrate rotation and positioning system
- positioned flap of technological devices

On the upper flange of the chamber are located three quartz sensors for monitoring the thickness of the sprayed layers.

Installation management is automatic and software-based. The deposition thickness is controlled by quartz thickness meters

## Technical specifications

- Voltage, V: 380В +10-15 %
- Power, kW: 22,5 KW
- Dimensions *(Length x Width x Height),  mm, not more than: (length x width x height) mm 1428х1010х1933
- Maximum current consumption per phase, A: 32 A
- Ultimate vacuum, Pa: no more than 3·10-4 Pa
- Weight, kg: не более 550 кг/no more than 550 kg
- Time to reach working vacuum, min.: no more than 15 мин.
- Working gases: argon
- Number of gas injection channels, pcs.: 1
- Time to reach ultimate vacuum, min.: no more than 2 hours
- Working vacuum , Pa: 2·10-3 Pa
- Service area: (length x width) mm 2190x2380